Plasma treatment

Pretreatment for Ion source


Unique Ion Shower Technology


Dust-Free Ion Gun Technology

Thin Film Properties Adjustment Techniques

  • 1

    100-300V Ar ion beam collides with substrate surface to remove holes on substrate surface

  • 2

    Improved roughness of substrate surface

  • 3

    Controlled a Grain size

HiPIMS(High Power Impulse Magnetron Sputtering) Technology

  • 1

    Apply the negative potential of HiPIMS power to form a high density plasma near the target

  • 2

    Sputter particles converted to cations by high density plasma

  • 3

    Controlled thin film phase & structure

  • 4

    Able to change a pulse width

  • 5

    Improved adhesion & stress