Plasma treatment
Pretreatment for Ion source
1
Unique Ion Shower Technology
2
Dust-Free Ion Gun Technology
Thin Film Properties Adjustment Techniques
1
100-300V Ar ion beam collides with substrate surface to remove holes on substrate surface
2
Improved roughness of substrate surface
3
Controlled a Grain size
HiPIMS(High Power Impulse Magnetron Sputtering) Technology
1
Apply the negative potential of HiPIMS power to form a high density plasma near the target
2
Sputter particles converted to cations by high density plasma
3
Controlled thin film phase & structure
4
Able to change a pulse width
5
Improved adhesion & stress