Pretreatment for Ion source

1

Unique Ion Shower Technology

2

Dust-Free Ion Gun Technology

Thin Film Properties Adjustment Techniques

• 1

  100-300V Ar ion beam collides with substrate surface to remove holes on substrate surface

• 2

  Improved roughness of substrate surface

• 3

  Controlled a Grain size

HiPIMS(High Power Impulse Magnetron Sputtering) Technology

• 1

  Apply the negative potential of HiPIMS power to form a high density plasma near the target

• 2

  Sputter particles converted to cations by high density plasma

• 3

  Controlled thin film phase & structure

• 4

  Able to change a pulse width

• 5

  Improved adhesion & stress